Cases 1 - 3 of 3
Lamba v. ASML US, L.P. et al
as 5:2023cv01833
Plaintiff:
Vishal Lamba
Defendant:
ASML US, L.P. and Shannon Hildreth
Cause Of Action: 28 U.S.C. § 1332 Diversity-Petition for Removal
IN THE MATTER OF CERTAIN SEMICONDUCTOR LITHOGRAPHY SYSTEMS AND COMPONENTS THEREOF et al
as 1:2018mc00186
Undetermined:
ASML US, LLC, ASML US, L.P. and ASML NETHERLANDS B.V.
In Re:
IN THE MATTER OF CERTAIN SEMICONDUCTOR LITHOGRAPHY SYSTEMS AND COMPONENTS THEREOF
ASML Netherlands B.V. et al v. Nikon Corporation et al
as 3:2018cv05592
Defendant:
Nikon Precision Inc., Nikon Corporation and Nikon Research Corporation of America
Plaintiff:
ASML Netherlands B.V., ASML US, LLC and ASML US, L.P.
Cause Of Action: 35 U.S.C. § 271
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